Nanotechnology Project

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Inventories

Environment, Health and Safety Research

Assessing the Utility of Control Banding in the U.S.

Project Information

Principal InvestigatorThomas Lentz
InstitutionNational Institute for Occupational Safety and Health
Project URLView
Relevance to ImplicationsSome
Class of NanomaterialGeneric
Impact SectorCross-cutting
Broad Research Categories Control
Risk Assessment
NNI identifier

Funding Information

CountryUSA
Anticipated Total Fundingn/a
Annual Fundingn/a
Funding SourceNIOSH
Funding MechanismIntramural
Funding SectorGovernment
Start Year2004
Anticipated End Year2006

Abstract/Summary

In the area of innovative, efficient, and cost-effective control approaches to protect workers from materials with poorly understood toxicity, NIOSH has taken a leadership role to evaluate the potential of applying “control banding” approaches to nanotechnology handling and processing activities. NIOSH implemented a control banding initiative in FY2004 which included coordinating and co-sponsoring the 2nd International Control Banding Workshop in Cincinnati, Ohio (March 1-2, 2004). This forum emphasized the utility of control-focused strategies for addressing chemical exposures and other occupational hazards such as nanomaterials, especially in the area of pharmaceutical manufacturing where this approach has a history. Dr. Howard, Director of NIOSH, and John Henshaw, Assistant Secretary of Labor (OSHA director) were featured speakers at the Workshop, as well as other representatives from European Union countries, the World Health Organization, and other international organizations. Nearly 200 participants, including NIOSH personnel and representatives from throughout the United States in government, industry, consulting, labor, and academia, attended the workshop. Subsequent efforts to promote discussion of control banding have included NIOSH presentations at the British Occupational Hygiene Society Meeting (Stratford-upon-Avon, U.K., April 2004), the American Industrial Hygiene Conference and Exposition (Atlanta, GA, May 2004), and Exposure 2004 (Utrecht, the Netherlands).